Photomask Fabrication Technology

By Benjamin G. Eynon & Banqiu Wu

Photomask Fabrication Technology - Benjamin G. Eynon & Banqiu Wu
  • Release Date: 2005-08-11
  • Genre: Engineering

Description

Photomasks, the printing masters for the fabrication of integrated circuits, have become a necessity of modern semiconductor manufacturing. This book details the science and technology of industrial photo mask production, including fundamental principles, industrial production flows, and technological evolution.